Groupes protecteurs dans les polymeres, les photoresines et procedes de microlithographie

Protecting groups in polymers, photoresists and processes for microlithography

Abstract

The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as (193) nm and (157) nm.
La présente invention concerne une composition de photorésine possédant un groupe protecteur et une matière protégée incorporée dans une structure chimique cyclique. Dans cette invention, une matière protégée possède un groupe éther cyclique ou un groupe ester cyclique comme groupe protecteur. Un exemple spécifique de groupe éther cyclique est un oxyde d'alkylène, tel qu'un groupe oxétanne, substitué par un ou plusieurs groupes alkyles fluorés. Un exemple spécifique d'ester cyclique est un lactone qui peut être substitué par des groupes méthyles. La composition de photorésine de cette invention comprend en outre un composant photosensible. La composition de photorésine de cette invention possède une grande transparence au rayonnement ultraviolet, en particulier à de courtes longueurs d'ondes telles que 193 nm et 157 nm.

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    Title
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