Appareil lithographique et procédé pour la production d'un dispositif

Lithographic apparatus and device manufacturing method

Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung

Abstract

An immersion lithography apparatus comprising a lens, formed from a liquid, which may be the immersion liquid located between the final element of the projection system and the substrate, and having optical properties that may be tuned by a tuning device. The tuning device is arranged to adjust properties of the liquid lens such as the shape, composition, refractive index or absorptivity as a function of space or time in order to change the imaging performance of the apparatus.

Claims

Description

Topics

Download Full PDF Version (Non-Commercial Use)

Patent Citations (5)

    Publication numberPublication dateAssigneeTitle
    JP-H10340846-ADecember 22, 1998Nikon Corp, 株式会社ニコン露光装置及びその製造方法並びに露光方法及びデバイス製造方法
    US-2002006561-A1January 17, 2002Nikon CorporationProjection exposure apparatus and method
    US-5610683-AMarch 11, 1997Canon Kabushiki KaishaImmersion type projection exposure apparatus
    US-5883704-AMarch 16, 1999Nikon CorporationProjection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
    WO-2004053596-A2June 24, 2004Carl Zeiss Smt AgProcede de reglage d'une propriete optique souhaitee d'un objectif de projection et installation d'eclairage de projection microlithographique

NO-Patent Citations (1)

    Title
    PATENT ABSTRACTS OF JAPAN vol. 1999, no. 03 31 March 1999 (1999-03-31)

Cited By (72)

    Publication numberPublication dateAssigneeTitle
    US-7616290-B2November 10, 2009Canon Kabushiki KaishaExposure apparatus and method
    US-8174668-B2May 08, 2012Nikon CorporationExposure apparatus and method for producing device
    WO-2008122410-A2October 16, 2008Carl Zeiss Smt AgOptical correction element and method for the correction of temperature-induced imaging aberrations in optical systems, projection objective and projection exposure apparatus for semiconductor lithography
    EP-1753016-A1February 14, 2007Nikon CorporationExposure apparatus and device producing method
    US-8134682-B2March 13, 2012Nikon CorporationExposure apparatus and method for producing device
    US-9599907-B2March 21, 2017Nikon CorporationExposure apparatus and device manufacturing method
    EP-1895570-A1March 05, 2008Nikon CorporationExposure method, exposure apparatus and device manufacturing method
    US-7256932-B2August 14, 2007Carl Zeiss Smt AgOptical system for ultraviolet light
    US-7428105-B2September 23, 2008Carl Zeiss Smt AgObjectives as a microlithography projection objective with at least one liquid lens
    US-8199333-B2June 12, 2012Carl Zeiss Smt GmbhOptical scattering disk, use thereof, and wavefront measuring apparatus
    EP-1703548-A1September 20, 2006Nikon CorporationAppareil et procede d'exposition, dispositif associe
    US-8169591-B2May 01, 2012Nikon CorporationExposure apparatus, exposure method, and method for producing device
    US-8860924-B2October 14, 2014Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
    US-9817322-B2November 14, 2017Carl Zeiss Smt GmbhOptical imaging device and method for reducing dynamic fluctuations in pressure difference
    US-8780327-B2July 15, 2014Nikon CorporationExposure apparatus and method for producing device
    US-7474469-B2January 06, 2009Carl Zeiss Smt AgArrangement of optical elements in a microlithographic projection exposure apparatus
    US-9436095-B2September 06, 2016Carl Zeiss Smt GmbhExposure apparatus and measuring device for a projection lens
    US-9684251-B2June 20, 2017Carl Zeiss Smt GmbhMicrolithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
    US-7719658-B2May 18, 2010Carl Zeiss Smt AgImaging system for a microlithographical projection light system
    US-8488099-B2July 16, 2013Nikon CorporationExposure apparatus and device manufacturing method
    US-8253924-B2August 28, 2012Nikon CorporationExposure method, exposure apparatus and device manufacturing method
    US-9477158-B2October 25, 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
    WO-2007031182-A1March 22, 2007Carl Zeiss Smt AgMicrolithographic projection exposure apparatus and method for setting an optical imaging property thereof
    US-8760617-B2June 24, 2014Nikon CorporationExposure apparatus and method for producing device
    US-8670104-B2March 11, 2014Nikon CorporationCleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object
    US-8072576-B2December 06, 2011Nikon CorporationExposure apparatus and method for producing device
    US-8525971-B2September 03, 2013Nikon CorporationLithographic apparatus with cleaning of substrate table
    US-8330935-B2December 11, 2012Carl Zeiss Smt GmbhExposure apparatus and measuring device for a projection lens
    US-2010141912-A1June 10, 2010Carl Zeiss Smt AgExposure apparatus and measuring device for a projection lens
    US-8704997-B2April 22, 2014Nikon CorporationImmersion lithographic apparatus and method for rinsing immersion space before exposure
    US-9477159-B2October 25, 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
    WO-2008122410-A3January 29, 2009Olaf Conradi, Aurelian Dodoc, Daniel Kraehmer, Ulrich Loering, Zeiss Carl Smt AgOptical correction element and method for the correction of temperature-induced imaging aberrations in optical systems, projection objective and projection exposure apparatus for semiconductor lithography
    US-9304392-B2April 05, 2016Nikon CorporationExposure apparatus and method for producing device
    US-8520184-B2August 27, 2013Nikon CorporationImmersion exposure apparatus and device manufacturing method with measuring device
    US-2007242243-A1October 18, 2007Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
    EP-1939689-A1July 02, 2008DSM IP Assets B.V.Immersion fluid and method for producing microchips
    US-8130363-B2March 06, 2012Nikon CorporationExposure apparatus and method for producing device
    EP-2161619-A1March 10, 2010Nikon CorporationReinigungsverfahren für Optik in Immersionslithographie
    US-8085381-B2December 27, 2011Nikon CorporationCleanup method for optics in immersion lithography using sonic device
    US-8169592-B2May 01, 2012Nikon CorporationExposure apparatus and method for producing device
    US-8493545-B2July 23, 2013Nikon CorporationCleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port
    US-8670103-B2March 11, 2014Nikon CorporationCleanup method for optics in immersion lithography using bubbles
    US-8902401-B2December 02, 2014Carl Zeiss Smt GmbhOptical imaging device with thermal attenuation
    EP-1753016-A4August 26, 2009Nippon Kogaku KkBelichtungsvorrichtung und bauelemente-herstellungsverfahren
    EP-1703548-A4September 17, 2008Nippon Kogaku KkExposure apparatus, exposure method, and device producing method
    US-9588436-B2March 07, 2017Nikon CorporationExposure apparatus, exposure method, and device producing method
    WO-2008009356-A1January 24, 2008Carl Zeiss Smt AgÉquipement d'éclairage par projection microlithographique et procédé de correction des erreurs de représentation
    US-8018571-B2September 13, 2011Nikon CorporationExposure apparatus and exposure method, and device manufacturing method
    US-9645505-B2May 09, 2017Nikon CorporationImmersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
    US-8384877-B2February 26, 2013Nikon CorporationExposure apparatus and method for producing device
    EP-1895570-A4March 09, 2011Nippon Kogaku KkBelichtungsverfahren, belichtungsvorrichtung und bauelementeherstellungsverfahren
    US-9810996-B2November 07, 2017Carl Zeiss Smt GmbhOptical imaging device with thermal attenuation
    US-8125612-B2February 28, 2012Nikon CorporationExposure apparatus and method for producing device
    EP-1926127-A1May 28, 2008Nikon CorporationAppareil et procede d'exposition, et procede de fabrication du dispositif
    US-9081310-B2July 14, 2015Carl Zeiss Smt GmbhOptical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same
    US-8363206-B2January 29, 2013Carl Zeiss Smt GmbhOptical imaging device with thermal attenuation
    WO-2015032418-A1March 12, 2015Carl Zeiss Smt GmbhMicrolithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
    EP-1926127-A4June 03, 2009Nippon Kogaku KkAppareil et procede d'exposition, et procede de fabrication du dispositif
    US-8064044-B2November 22, 2011Nikon CorporationExposure apparatus, exposure method, and device producing method
    WO-2011116792-A1September 29, 2011Carl Zeiss Smt GmbhOptical system, exposure apparatus, and waverfront correction method
    US-8269946-B2September 18, 2012Nikon CorporationCleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid
    NL-2000625-C2February 25, 2009Taiwan Semiconductor MfgKap voor immersielithografie.
    US-9063436-B2June 23, 2015Nikon CorporationExposure apparatus, exposure method, and method for producing device
    EP-1857882-A3July 02, 2008Carl Zeiss SMT AGOptische Abbildungsvorrichtung
    US-8027023-B2September 27, 2011Carl Zeiss Smt GmbhOptical imaging device and method for reducing dynamic fluctuations in pressure difference
    US-8587762-B2November 19, 2013Asml Netherlands B.V.Methods relating to immersion lithography and an immersion lithographic apparatus
    US-9477153-B2October 25, 2016Asml Netherlands B.V.Lithographic apparatus and device manufacturing method
    US-7265815-B2September 04, 2007Asml Holding N.V.System and method utilizing an illumination beam adjusting system
    US-8654346-B2February 18, 2014Carl Zeiss Smt GmbhOptical scattering disk, use thereof, and wavefront measuring apparatus
    EP-1857882-A2November 21, 2007Carl Zeiss SMT AGOptical imaging device
    WO-2006125600-A1November 30, 2006Carl Zeiss Smt AgDisque de diffusion optique, son utilisation, et appareil de mesure de front d'ondes
    US-7385764-B2June 10, 2008Carl Zeiss Smt AgObjectives as a microlithography projection objective with at least one liquid lens